MAGNETIC-PROPERTIES AND MICROSTRUCTURE OF SPUTTERED CO-CR FILMS

被引：12

作者：

UCHIYAMA, Y ^{[1
]}

ISHIBASHI, K ^{[1
]}

SATO, H ^{[1
]}

HWANG, U ^{[1
]}

SUZUKI, T ^{[1
]}

机构：

[1] TOHOKU UNIV,FAC ENGN,DEPT APPL PHYS,SENDAI,MIYAGI 980,JAPAN

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1987年 / 23卷 / 05期

关键词：

D O I：

10.1109/TMAG.1987.1065231

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2058 / 2060

页数：3

共 50 条

[1] MAGNETIC-PROPERTIES AND MICROSTRUCTURE OF SPUTTERED CO-CR FILMS
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[2] MICROSTRUCTURAL INHOMOGENEITY AND MAGNETIC-PROPERTIES IN CO-CR SPUTTERED FILMS
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[5] MAGNETIC-PROPERTIES OF MAGNETRON SPUTTERED CO-CR THIN-FILMS
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[J]. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1989, 79 (01) : 95 - 108
[7] CHANGES IN STRUCTURE AND MAGNETIC-PROPERTIES OF CO-CR FILMS BY OBLIQUE INCIDENT OF SPUTTERED PARTICLES
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[J]. IEEE TRANSACTIONS ON MAGNETICS, 1988, 24 (06) : 3015 - 3017
[8] THE CORRELATION OF TEXTURE AND MAGNETIC-PROPERTIES IN CO-CR FILMS
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[J]. JOURNAL OF ELECTRONIC MATERIALS, 1993, 22 (06) : 617 - 622
[9] MAGNETIC-PROPERTIES OF CO-CR FILMS ON CO-CR UNDER-LAYER WITH VARIOUS COMPOSITION
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