TRANSIENT PROCESSES DURING PORE FORMATION IN N-TYPE SILICON

被引:0
|
作者
VINKE, AL
KURBATOV, DA
MOKROUSOV, NE
PROKAZNIKOV, AV
机构
来源
RUSSIAN ELECTROCHEMISTRY | 1993年 / 29卷 / 08期
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Nonequilibrium processes occurring in an electrolyte-semiconductor system (hydrofluoric acid-n-type silicon) were studied during anodization in the mode of pore formation. The transition from transient modes of anodization with strongly nonlinear current-voltage characteristics to steady-state conditions was studied. The current-voltage curves obtained experimentally for the electrolyte-semiconductor (silicon) system is S-shaped. Processes of self-organization developing at the silicon' surface in the above system under the action of ultrasound were detected and experimentally investigated. The major aspects of these processes are concordant with those of the formation of three-dimensionally periodic structures at surfaces stimulated by laser light that had been studied previously.
引用
收藏
页码:1172 / 1176
页数:5
相关论文
共 50 条
  • [31] THE ELECTROPOLISHING OF N-TYPE SILICON
    MASLOVA, LV
    MATVEEV, OA
    AFANASEV, VF
    SOVIET PHYSICS-SOLID STATE, 1962, 3 (09): : 1968 - 1970
  • [32] Investigation of the hydrogen transport processes in crystalline silicon of n-type conductivity
    Saad, Anis
    Velichko, O. I.
    Shaman, Yu. P.
    Barcz, A.
    Misiuk, A.
    Fedotov, A. K.
    GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XII, 2008, 131-133 : 425 - +
  • [33] ELECTROPOLISHING OF N-TYPE GERMANIUM AND P-TYPE AND N-TYPE SILICON
    KLEIN, DL
    KOLB, GA
    POMPLIANO, LA
    SULLIVAN, MV
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (03) : C60 - C60
  • [35] OVERLAPPING ELECTRON TRAPS IN N-TYPE SILICON STUDIED BY CAPACITANCE TRANSIENT SPECTROSCOPY
    SVENSSON, BG
    RYDEN, KH
    LEWERENTZ, BMS
    JOURNAL OF APPLIED PHYSICS, 1989, 66 (04) : 1699 - 1704
  • [36] HYDROGEN DIFFUSION AND PASSIVATION PROCESSES IN P-TYPE AND N-TYPE CRYSTALLINE SILICON
    RIZK, R
    DEMIERRY, P
    BALLUTAUD, D
    AUCOUTURIER, M
    MATHIOT, D
    PHYSICAL REVIEW B, 1991, 44 (12): : 6141 - 6151
  • [37] Doping of electrochemically etched pore arrays in n-type silicon: Processing and electrical characterization
    Badel, X
    Domeij, M
    Linnros, J
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (04) : G252 - G258
  • [38] Formation of High Aspect Ratio Macropore Array on n-Type Silicon
    Wang, Guozheng
    Li, Xiaona
    Yu, Fengyuan
    Zhang, Yao
    Liang, Yongzhao
    Chai, Jin
    Yang, Jikai
    Duanmu, Qingduo
    ADVANCED DESIGN AND MANUFACTURING TECHNOLOGY III, PTS 1-4, 2013, 397-400 : 47 - 51
  • [39] INTERSTITIAL STAGE OF FORMATION OF DISORDERED REGIONS IN n-TYPE SILICON.
    Mikhnovich, V.V.
    Titarenko, S.G.
    1600, (18):
  • [40] SUPPRESSION OF THERMAL DONOR FORMATION IN HEAVILY DOPED N-TYPE SILICON
    WADA, K
    INOUE, N
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) : 5145 - 5147