DIRECT WRITING OF SILICON LINES BY PYROLYTIC ARGON-LASER CVD

被引：5
|
作者：
ISHIZU, A [1 ]
INOUE, Y [1 ]
NISHIMURA, T [1 ]
AKASAKA, Y [1 ]
MIKI, H [1 ]
机构：
[1] MITSUBISHI ELECT CORP, LSI RES & DEV LAB, ITAMI, HYOGO 664, JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1986年 / 25卷 / 12期
关键词：
D O I：
10.1143/JJAP.25.1830
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1830 / 1833
页数：4
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