GROWTH-MECHANISM OF DIRECT WRITING OF SILICON IN AR+ LASER CVD

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作者：
NAGAHORI, T
MATSUMOTO, S
机构：
来源：
LASER- AND PARTICLE-BEAM CHEMICAL PROCESSES ON SURFACES | 1989年 / 129卷
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中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
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页码：189 / 194
页数：6
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