DIRECT WRITING OF SILICON LINES BY PYROLYTIC ARGON-LASER CVD

被引：5

|

作者：

ISHIZU, A ^{[1
]}

INOUE, Y ^{[1
]}

NISHIMURA, T ^{[1
]}

AKASAKA, Y ^{[1
]}

MIKI, H ^{[1
]}

机构：

[1] MITSUBISHI ELECT CORP, LSI RES & DEV LAB, ITAMI, HYOGO 664, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1986年 / 25卷 / 12期

关键词：

D O I：

10.1143/JJAP.25.1830

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1830 / 1833

页数：4

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