A Study of Moisture Effects on Ti/Porous Silicon/Silicon Schottky Barrier
被引:0
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作者:
V. Strikha
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机构:Kiev National Shevchenko University,Radiophysics Department
V. Strikha
V. Skryshevsky
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机构:Kiev National Shevchenko University,Radiophysics Department
V. Skryshevsky
V. Polishchuk
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机构:Kiev National Shevchenko University,Radiophysics Department
V. Polishchuk
E. Souteyrand
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机构:Kiev National Shevchenko University,Radiophysics Department
E. Souteyrand
J.R. Martin
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机构:Kiev National Shevchenko University,Radiophysics Department
J.R. Martin
机构:
[1] Kiev National Shevchenko University,Radiophysics Department
[2] Ecole Centrale de Lyon,undefined
来源:
Journal of Porous Materials
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2000年
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7卷
关键词:
porous Si;
Schottky barrier;
moisture sensor;
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摘要:
Results of capacitance-voltage and current-voltage measurements performed on Ti/porous silicon (PS)/p-Si diode structures are presented. A 5–10 increase of conductivity and capacity has been observed at f < 10000 Hz in response to the moisture change from 0 to 50%. Model of Schottky contact on thin PS layer with the charge carriers inside of pores and PS/Si interface is applied to explain the frequency dependence of conductivity/capacity as well as moisture effect.
机构:
SiCLAB, Rutgers University, 94 Brett Road, Piscataway, NJ 08854, United StatesSiCLAB, Rutgers University, 94 Brett Road, Piscataway, NJ 08854, United States
Zhao, Jian H.
Sheng, Kuang
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机构:
SiCLAB, Rutgers University, 94 Brett Road, Piscataway, NJ 08854, United StatesSiCLAB, Rutgers University, 94 Brett Road, Piscataway, NJ 08854, United States
Sheng, Kuang
Lebron-Velilla, Ramon C.
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机构:
NASA Glenn Research Center, 21000 Brookpark Road, Cleaveland, OH 44135, United StatesSiCLAB, Rutgers University, 94 Brett Road, Piscataway, NJ 08854, United States