Observations of deep levels in 4H-SiC using optoelectronic modulation spectroscopy

被引:0
|
作者
Chi-Hsin Chiu
P. J. M. Parmiter
K. Hilton
M. J. Uren
J. G. Swanson
机构
[1] King‘s College London,Department of Electronic, Engineering
[2] DERA MALVERN,undefined
来源
关键词
OEMS; 4H-SiC; defects; semiconductor; optical; hole trap; electron trap; delocalized trap; MESFET;
D O I
暂无
中图分类号
学科分类号
摘要
Optoelectronic modulation spectroscopy (OEMS) has been used to reveal defect states in 4H-SiC. Pairs of magnitude and phase spectra have been used to infer whether they were electron or hole traps. Eleven discrete trap responses have been observed, eight were assigned as electron traps and three as hole traps. Five of these had been observed previously using optical admittance spectroscopy (OAS). An electron trap at 1.20 eV gave the most prominent response with a distinctive signature indicating that these traps were spatially delocalized with an extent of at least 1.35 nm, possibly associated with an extended defect structure. An unresolved continuum of be the superimposed response of an electron and hole trap at closely similar energies. Cosistency has been demonstrated with previous work using DLOS and OAS.
引用
收藏
页码:1361 / 1368
页数:7
相关论文
共 50 条
  • [31] Deep levels related to the carbon antisite-vacancy pair in 4H-SiC
    Nakane, Hiroki
    Kato, Masashi
    Ohkouchi, Yutaro
    Xuan Thang Trinh
    Ivanov, Ivan G.
    Ohshima, Takeshi
    Son, Nguyen Tien
    JOURNAL OF APPLIED PHYSICS, 2021, 130 (06)
  • [32] Fermi level control and deep levels in semi-insulating 4H-SiC
    Mitchel, WC
    Perrin, R
    Goldstein, J
    Saxler, A
    Roth, M
    Smith, SR
    Solomon, JS
    Evwaraye, AO
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) : 5040 - 5044
  • [33] Impacts of growth parameters on deep levels in n-type 4H-SiC
    Danno, Katsunori
    Hori, Tsutomu
    Kimoto, Tsunenobu
    JOURNAL OF APPLIED PHYSICS, 2007, 101 (05)
  • [34] Electron spectroscopy with a commercial 4H-SiC photodiode
    Zhao, S.
    Lioliou, G.
    Butera, S.
    Whitaker, M. D. C.
    Barnett, A. M.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2018, 910 : 35 - 40
  • [35] Selective growth of 4H-SIC on 4H-SiC substrates using a high temperature mask
    Li, C
    Seiler, J
    Bhat, I
    Chow, TP
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 185 - 188
  • [36] Deep levels in electron-irradiated n- and p-type 4H-SiC investigated by deep level transient Spectroscopy
    Danno, Katsunori
    Kimoto, Tsunenobu
    SILICON CARBIDE AND RELATED MATERIALS 2006, 2007, 556-557 : 331 - +
  • [37] Acceptor levels of the carbon vacancy in 4H-SiC: Combining Laplace deep level transient spectroscopy with density functional modeling
    Capan, Ivana
    Brodar, Tomislav
    Coutinho, Jose
    Ohshima, Takeshi
    Markevich, Vladimir P.
    Peaker, Anthony R.
    JOURNAL OF APPLIED PHYSICS, 2018, 124 (24)
  • [38] Characterization of deep levels in n-type 4H-SiC single crystals by means of a piezoelectric photothermal and a photoluminescence spectroscopy
    Sakai, K
    Tada, S
    Fukuyama, A
    Ikari, T
    PHYSICA B-CONDENSED MATTER, 2003, 340 : 137 - 140
  • [39] Major deep levels with the same microstructures observed in n-type 4H-SiC and 6H-SiC
    Sasaki, S.
    Kawahara, K.
    Feng, G.
    Alfieri, G.
    Kimoto, T.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (01)
  • [40] Deep hole traps in As-grown 4H-SiC epilayers investigated by deep level transient spectroscopy
    Danno, K.
    Kimoto, T.
    SILICON CARBIDE AND RELATED MATERIALS 2005, PTS 1 AND 2, 2006, 527-529 : 501 - +