Anisotropic Magnetoresistance of Nano-conductive Filament in Co/HfO2/Pt Resistive Switching Memory

被引:0
|
作者
Leilei Li
Yang Liu
Jiao Teng
Shibing Long
Qixun Guo
Meiyun Zhang
Yu Wu
Guanghua Yu
Qi Liu
Hangbing Lv
Ming Liu
机构
[1] University of Science and Technology Beijing,Department of Materials Physics and Chemistry
[2] Institute of Microelectronics,Key Laboratory of Microelectronic Devices & Integrated Technology
[3] Chinese Academy of Sciences,Nanoscale Physics & Devices Laboratory
[4] Institute of Physics,undefined
[5] Chinese Academy of Sciences,undefined
[6] University of Chinese Academy of Sciences,undefined
[7] Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM),undefined
来源
关键词
Conductive bridge random access memory; Resistive switching; Conductive filament; Anisotropic magnetoresistance;
D O I
暂无
中图分类号
学科分类号
摘要
Conductive bridge random access memory (CBRAM) has been extensively studied as a next-generation non-volatile memory. The conductive filament (CF) shows rich physical effects such as conductance quantization and magnetic effect. But so far, the study of filaments is not very sufficient. In this work, Co/HfO2/Pt CBRAM device with magnetic CF was designed and fabricated. By electrical manipulation with a partial-RESET method, we controlled the size of ferromagnetic metal filament. The resistance-temperature characteristics of the ON-state after various partial-RESET behaviors have been studied. Using two kinds of magnetic measurement methods, we measured the anisotropic magnetoresistance (AMR) of the CF at different temperatures to reflect the magnetic structure characteristics. By rotating the direction of the magnetic field and by sweeping the magnitude, we obtained the spatial direction as well as the easy-axis of the CF. The results indicate that the easy-axis of the CF is along the direction perpendicular to the top electrode plane. The maximum magnetoresistance was found to appear when the angle between the direction of magnetic field and that of the electric current in the CF is about 30°, and this angle varies slightly with temperature, indicating that the current is tilted.
引用
收藏
相关论文
共 50 条
  • [41] Electroforming Atmospheric Temperature and Annealing Effects on Pt/HfO2/TiO2/HfO2/Pt Resistive Random Access Memory Cell
    Napolean, A.
    Sivamangai, N. M.
    NaveenKumar, R.
    Nithya, N.
    [J]. SILICON, 2022, 14 (06) : 2863 - 2869
  • [42] Roles and Effects of TiN and Pt Electrodes in Resistive-Switching HfO2 Systems
    Goux, L.
    Wang, X. P.
    Chen, Y. Y.
    Pantisano, L.
    Jossart, N.
    Govoreanu, B.
    Kittl, J. A.
    Jurczak, M.
    Altimime, L.
    Wouters, D. J.
    [J]. ELECTROCHEMICAL AND SOLID STATE LETTERS, 2011, 14 (06) : H244 - H246
  • [43] Improved resistive switching characteristics of a Pt/HfO2/Pt resistor by controlling anode interface with forming and switching polarity
    Jung, Yong Chan
    Seong, Sejong
    Lee, Taehoon
    Kim, Seon Yong
    Park, In-Sung
    Ahn, Jinho
    [J]. APPLIED SURFACE SCIENCE, 2018, 435 : 117 - 121
  • [44] THE INFLUENCE OF TECHNOLOGY AND SWITCHING PARAMETERS ON RESISTIVE SWITCHING BEHAVIOR OF Pt/HfO2/TiN MIM STRUCTURES
    Paskaleva, Albena
    Hudec, Boris
    Jancovic, Peter
    Froehlich, Karol
    Spassov, Dencho
    [J]. FACTA UNIVERSITATIS-SERIES ELECTRONICS AND ENERGETICS, 2014, 27 (04) : 621 - 630
  • [45] Grain boundaries as preferential sites for resistive switching in the HfO2 resistive random access memory structures
    Lanza, M.
    Zhang, K.
    Porti, M.
    Nafria, M.
    Shen, Z. Y.
    Liu, L. F.
    Kang, J. F.
    Gilmer, D.
    Bersuker, G.
    [J]. APPLIED PHYSICS LETTERS, 2012, 100 (12)
  • [46] Asymmetric Current Behavior on Unipolar Resistive Switching in Pt/HfO2/Pt Resistor With Symmetric Electrodes
    Kang, Jiehun
    Park, In-Sung
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (06) : 2380 - 2383
  • [47] Study of the resistive switching effect in In/HfO2/Ptdevices
    Quinonez, M. F.
    Suarez, L.
    Ordonez, J. E.
    Arango, I. C.
    Gomez, M. E.
    Lopera, W.
    [J]. MATERIALS TODAY-PROCEEDINGS, 2019, 14 : 139 - 143
  • [48] Enhanced resistive switching performance for bilayer HfO2/TiO2 resistive random access memory
    Ye, Cong
    Deng, Tengfei
    Zhang, Junchi
    Shen, Liangping
    He, Pin
    Wei, Wei
    Wang, Hao
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2016, 31 (10)
  • [49] Barrier Potential Engineering in Ti/HfO2/Pt Resistive Random Access Memory
    Kumar, S. Sachin
    Sahu, Paritosh Piyush
    Panda, Debashis
    [J]. JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2017, 17 (12) : 9328 - 9332
  • [50] Insights into Ni-filament formation in unipolar-switching Ni/HfO2/TiN resistive random access memory device
    Chen, Yang Yin
    Pourtois, G.
    Adelmann, C.
    Goux, L.
    Govoreanu, B.
    Degreave, R.
    Jurczak, M.
    Kittl, J. A.
    Groeseneken, G.
    Wouters, D. J.
    [J]. APPLIED PHYSICS LETTERS, 2012, 100 (11)