Magnetron source of accelerated plasma flow

被引：0
|
作者：
L. P. Veresov
O. L. Veresov
机构：
[1] Sukhumi Institute of Physics and Technology,
来源：
Technical Physics | 2016年 / 61卷
关键词：
Cathode Region; Plasma Accelerator; Vapor Fraction; Magnetron Discharge; Cathode Block;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A new source of an accelerated plasma flow intended for depositing high-quality coatings is described. In this source, a magnetron discharge for cathode target sputtering is combined with a high-voltage discharge with longitudinal oscillation of electrons for ionization of the accrued vapor in which the plasma density is distributed uniformly owing to the application of three-phase ionizer.
引用
收藏
页码：59 / 67
页数：8
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