Plasma enhanced direct current planar magnetron sputtering technique employing a twinned microwave electron cyclotron resonance plasma source

被引：8
|
作者：
Xu, J. [1 ]
Deng, X. [1 ]
Yu, S. [1 ]
Lu, W. [1 ]
Ma, T. [1 ]
机构：
[1] Department of Physics, State Key Lab Materials Modification, Dalian University of Technology, Dalian 116024, China
来源：
Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films | 2001年 / 19卷 / 02期
关键词：
Bonding - Carbon nitride - Current voltage characteristics - Electron cyclotron resonance - Plasma applications - Plasma confinement - Plasma sources - Sputter deposition - Synthesis (chemical);
D O I：
10.1116/1.1340654
中图分类号：
学科分类号：
摘要：
The direct current discharge characteristics of a planar magnetron was studied. The discharge was enhanced by a twinned microwave electron cyclotron resonance plasma source. The sputtering discharge characteristics revealed a combined mode of voltage and current at a pressure as low as 0.007 Pa. The synthesis of carbon-nitride thin films via magnetron sputtering were described.
引用
收藏
页码：425 / 428
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