Oxidized bridges technology for suspended MEMS fabrication using standard silicon wafer

被引：0
|
作者：
A. Postnikov
O. V. Morozov
I. I. Amirov
机构：
[1] Russian Academy of Sciences,Physics
来源：
Microsystem Technologies | 2015年 / 21卷
关键词：
Trench; Electrical Isolation; Comb Drive; Substrate Bias Voltage; Bulk Micromachining;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
This paper presents a new method for electrically isolating released single crystal silicon MEMS structures. The technology employees double-side processing deep reactive ion etching to obtain functional high aspect ratio micromechanical structures and deep silicon oxidizing to isolate them from bulk silicon. Applicability of the technology to MEMS design was demonstrated with fabrication of the monolithic integrated bulk micromachined comb drive.
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收藏
页码：669 / 674
页数：5
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