ToF-SIMS depth profiling of altered glass

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作者
Marie Collin
Stéphane Gin
Patrick Jollivet
Laurent Dupuy
Vincent Dauvois
Laurent Duffours
机构
[1] CEA,Tescan Analytics
[2] DEN,DEN
[3] DE2D,Service d′Etude du Comportement des Radionucléides, CEA
[4] SEVT,PRIME Verre
[5] ZAC St Charles,undefined
[6] Université Paris-Saclay,undefined
[7] PAT du Millénaire bâtiment 10,undefined
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Glass and mineral corrosion usually leads to the formation of morphologically and compositionally complex surface layers that can be characterized by various analytical techniques to infer rate control mechanisms. In this study, we investigate the capabilities and limitations of time-of-flight secondary ion mass spectrometry (ToF-SIMS) to better understand chemical processes of glass corrosion. In particular, we focus on the potential impact of the ToF-SIMS ion beam on the distribution of several elements of interest in alteration layers formed on International Simple Glass, a six-oxide reference glass altered in a solution enriched in alkalis and spiked with H218O. A thin flake of glass partially altered on both sides is analyzed entirely from one side to the other to determine whether atoms weakly bonded to the solid are displaced by the beams. We highlight the beam effect on cations weakly bonded to the silicate network (Li, Na, K, and B, Ca, Cs to a lesser extent) affecting the profile shape of these elements. No impact is observed on 18O and H, but it is demonstrated that quantification of isotopic ratios is possible only for a limited range of isotopic enrichment.
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