Application of Two-Wavelength X-Ray Optical Scheme for Combined Measurements of X-Ray Specular Reflection and Diffuse Scattering to Study Multilayered Thin Film Structures

被引：1
|
作者：
Smirnov D.I. [1 ,2 ]
Gerasimenko N.N. [1 ,2 ,3 ]
Ovchinnikov V.V. [4 ]
机构：
[1] National Research University of Electronic Technology MIET, Moscow
[2] Lebedev Physical Institute, Russian Academy of Sciences, Moscow
[3] Tomsk National Research State University, Tomsk
[4] Institute of Electrophysics, Ural Branch, Russian Academy of Sciences, Ekaterinburg
来源：
Russian Microelectronics | 2017年 / 46卷 / 07期
基金：
俄罗斯科学基金会;
关键词：
thin film nanostructures; two-wavelength X-ray optical scheme; X-ray diffuse scattering; X-ray reflectometry;
D O I：
10.1134/S1063739717070101
中图分类号：
学科分类号：
摘要：
The complex study results of the parameters of TiN/Ti diffusion-barrier structures using the methods of relative X-ray reflectometry and diffuse scattering of X-ray radiation implemented by a two-wavelength X-ray optical measurement scheme are presented. It is shown that this scheme, by a single measurement, enables studying two different diffuse scattering regions, which increases the correctness and unambiguity of the analysis that was carried out. The considered complex of methods makes it possible to solve the ambiguity of a density/roughness type by the solution of the inverse reflectometry problem and to calculate the parameters of buried layers in the structures which were studied. © 2017, Pleiades Publishing, Ltd.
引用
收藏
页码：523 / 526
页数：3
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