Origin of Degradation of the CaF2/BaF2 Buffer Layers on Si(111)

被引：0
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作者：
I. G. Neizvestny
D. V. Ishchenko
I. O. Akhundov
S. P. Suprun
O. E. Tereshchenko
机构：
[1] Rzhanov Institute of Semiconductor Physics,
[2] Siberian Branch,undefined
[3] Russian Academy of Sciences,undefined
来源：
Doklady Physics | 2020年 / 65卷
关键词：
calcium fluoride on silicon; adhesion; epitaxy; interface.;
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页码：15 / 17
页数：2
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