Size measurements in microelectronic technology

被引：0
|
作者：
A. V. Nikitin
机构：
[1] Institute of Arts and Information Technologies,
[2] Branch,undefined
来源：
Measurement Techniques | 2012年 / 55卷
关键词：
algorithms; nonlinearity; calibration of magnification; reproducibility and accuracy of results;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The status of and problems with size measurements in the technologies for fabrication of microelectronic devices with dimensions of hundreds or tens of nanometers are examined under industrial production conditions. It is argued that relative measurements are inadequate and it is necessary to proceed to measurements on an absolute size scale that will ensure absolute accuracy of the results, as well as their reproducibility, which are especially important for the development of nanometer-sized devices.
引用
收藏
页码：867 / 875
页数：8
相关论文
共 50 条
  • [41] Evolution of cooling technology for electrical, electronic, and microelectronic equipment
    Bergles, AE
    IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, 2003, 26 (01): : 6 - 15
  • [42] A Fiber DLS System Based on Microfluidics Technology for Particle Size Measurements
    Zhang, Pan
    Xiao, Long
    Yang, Jingxian
    Li, Wei
    Xia, Min
    Guo, Wenping
    2019 INTERNATIONAL APPLIED COMPUTATIONAL ELECTROMAGNETICS SOCIETY SYMPOSIUM - CHINA (ACES), VOL 1, 2019,
  • [43] CELL-METABOLISM MEASUREMENTS IN CULTURE VIA MICROELECTRONIC BIOSENSORS
    GRATTAROLA, M
    MARTINOIA, S
    CARLINI, G
    CAMBIASO, A
    TEDESCO, M
    PARODI, MT
    FERRI, G
    CYTOTECHNOLOGY, 1991, 5 : 57 - 58
  • [44] Single nucleotide polymorphism and mutation identification by microelectronic chip technology
    Stenirri, S
    Foglieni, B
    Manitto, MP
    Martina, E
    Brancato, R
    Cremonesi, L
    Ferrari, M
    MINERVA BIOTECNOLOGICA, 2002, 14 (3-4) : 241 - 246
  • [45] Atomic layer deposition: An enabling technology for microelectronic device manufacturing
    Lee, Fourmun
    Marcus, Steve
    Shero, Eric
    Wilk, Glen
    Swerts, Johan
    Maes, Jan Willem
    Blomberg, Tom
    2007 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2007, : 291 - +
  • [46] The planar silicon-based microelectronic technology for electrochemical transducers
    Novikov, A. V.
    Egorchikov, A. E.
    Dolgov, A. N.
    Gornev, E. S.
    Popov, V. G.
    Egorov, I. V.
    Krishtop, V. G.
    INTERNATIONAL CONFERENCE ON MICRO- AND NANO-ELECTRONICS 2016, 2016, 10224
  • [47] KEYNOTE ADDRESS - MICROELECTRONIC TECHNOLOGY AND THE HEARING-IMPAIRED - THE FUTURE
    THORKILDSEN, R
    AMERICAN ANNALS OF THE DEAF, 1985, 130 (05) : 324 - 331
  • [48] Elaboration of gallium arsenide technology in Georgia for development of microelectronic devices
    Khuchua, NP
    Chakhnakia, ZD
    Khvedelidze, LV
    Melkadze, RG
    Tatunjan, AA
    Kalandadzes, GD
    Tutunjan, NA
    Diehl, R
    MICRO- AND NANOELECTRONICS 2003, 2004, 5401 : 344 - 353
  • [49] The future of silicon-on-insulator (SOI) technology in microelectronic systems
    Lemnios, ZJ
    Radack, DJ
    Zolper, JC
    2004 IEEE INTERNATIONAL SOI CONFERENCE, PROCEEDINGS, 2004, : 9 - 13
  • [50] OPTICAL-FIBER SENSOR TECHNOLOGY - A CHALLENGE TO MICROELECTRONIC SENSORS
    GRATTAN, KTV
    PALMER, AW
    SENSORS AND ACTUATORS A-PHYSICAL, 1992, 30 (1-2) : 129 - 137
12345