Adhesion of Irradiated Diazoquinone–Novolac Photoresist Films to Single-Crystal Silicon

被引：0

|

作者：

S. A. Vabishchevich

S. D. Brinkevich

N. V. Vabishchevich

D. I. Brinkevich

V. S. Prosolovich

机构：

[1] Polotsk State University,

[2] Belarussian State University,undefined

来源：

High Energy Chemistry | 2021年 / 55卷

关键词：

diazoquinone–novolac photoresist; γ-irradiation; adhesion; silicon;

D O I：

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学科分类号：

摘要：

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页码：495 / 501

页数：6

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