Adhesion of Irradiated Diazoquinone–Novolac Photoresist Films to Single-Crystal Silicon

被引：0
|
作者：
S. A. Vabishchevich
S. D. Brinkevich
N. V. Vabishchevich
D. I. Brinkevich
V. S. Prosolovich
机构：
[1] Polotsk State University,
[2] Belarussian State University,undefined
来源：
High Energy Chemistry | 2021年 / 55卷
关键词：
diazoquinone–novolac photoresist; γ-irradiation; adhesion; silicon;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
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页码：495 / 501
页数：6
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