Transformation of a SiC/por-SiC/TiO2 structure during rapid thermal annealing

被引：0
|
作者：
R. V. Konakova
O. F. Kolomys
O. S. Lytvyn
O. B. Okhrimenko
V. V. Strelchuk
A. M. Svetlichnyi
L. G. Linets
机构：
[1] National Academy of Sciences of Ukraine,Lashkaryov Institute of Semiconductor Physics
[2] Southern Federal University,Taganrog Institute of Technology
来源：
Semiconductors | 2012年 / 46卷
关键词：
Raman Spectrum; Rapid Thermal Anneal; Titanium Oxide Film; Tita Nium Silicide; Rapid Thermal Anneal Temperature;
D O I：
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学科分类号：
摘要：
The surface morphology and the Raman and photoluminescence spectra of a SiC/por-SiC/TiO2 structure before and after rapid thermal annealing are studied. It is shown that rapid thermal annealing brings about the appearance of new bands in the Raman spectrum; these bands are characteristic of carbon compounds. An analysis of the spectra of photoluminescence excited by radiation with an energy lower than that of the band-gap energy in 6H-SiC has shown that the appearance of photoluminescence in porous silicon carbide is related to impurity states, which are formed at the surface due to products of chemical reactions in the course of etching.
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页码：1221 / 1224
页数：3
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