The effect of etching on low-stress mechanical properties of polypropylene fabrics under helium/oxygen atmospheric pressure plasma

被引：0
|
作者：
Yoon J. Hwang
Jae Sang An
Marian G. McCord
Shin Woong Park
Bok Choon Kang
机构：
[1] Inha University,Department of Textile Engineering
[2] North Carolina State University,Department of Textile Engineering, Chemistry and Science, College of Textiles
[3] Apparel & Sweater Technical Service Center,Korea Institute of Industrial Technology
来源：
Fibers and Polymers | 2003年 / 4卷
关键词：
Atmospheric pressure plasma; KES-FB; XPS; SEM; Polypropylene;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Polypropylene nonwoven fabrics were exposed to He/O2 atmospheric pressure glow discharge plasma. Surface chemical analysis and contact angle measurement revealed the surface oxidation by formation of new functional groups after plasma treatment. Weight loss (%) measurement and scanning electron microscopy analysis showed a significant plasma etching effect. It was investigated in low-stress mechanical properties of the fabrics using Kawabata Evaluation System (KES-FB). The surface morphology change by plasma treatment increased surface friction due to an enhancement of fiber-to-fiber friction, resulting in change of other low-stress mechanical properties of fabric.
引用
收藏
页码：145 / 150
页数：5
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