Effect of rapid thermal annealing on the current-voltage characteristics of 4H-SiC Schottky diodes

被引：0
|
作者：
P. A. Ivanov
N. D. Il’inskaya
A. S. Potapov
T. P. Samsonova
A. V. Afanas’ev
V. A. Il’in
机构：
[1] Russian Academy of Sciences,Ioffe Physical
[2] Ul’yanov (Lenin) State Electrotechnical University,Technical Institute
来源：
Semiconductors | 2013年 / 47卷
关键词：
Barrier Height; Versus Characteristic; Voltage Drop; Rapid Thermal Annealing; Ideality Factor;
D O I：
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学科分类号：
摘要：
The effect of rapid thermal annealing (temperature 600–800°C; duration 2 min) on the forward current-voltage characteristics of 4H-SiC Schottky diodes is studied. Tungsten, nickel, chromium, and molybdenum deposited by electron-beam sputtering in vacuum are used as the Schottky-contact metals. Dissimilar types of influence exerted by the thermal treatment on the barrier height and scatter of the contact parameters, which characterize the degree of their uniformity, are found for different metals.
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页码：81 / 84
页数：3
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