Oxygen-doped germanium telluride phase change materials are proposed for high temperature applications. Up to 8 at.% oxygen is readily incorporated into GeTe, causing an increased crystallisation temperature and activation energy. The rhombohedral structure of the GeTe crystal is preserved in the oxygen doped films. For higher oxygen concentrations the material is found to phase separate into GeO2 and TeO2, which inhibits the technologically useful abrupt change in properties. Increasing the oxygen content in GeTe-O reduces the difference in film thickness and mass density between the amorphous and crystalline states. For oxygen concentrations between 5 and 6 at.%, the amorphous material and the crystalline material have the same density. Above 6 at.% O doping, crystallisation exhibits an anomalous density change, where the volume of the crystalline state is larger than that of the amorphous. The high thermal stability and zero-density change characteristic of Oxygen-incorporated GeTe, is recommended for efficient and low stress phase change memory devices that may operate at elevated temperatures.
机构:
Natl Inst Adv Ind Sci & Technol, Collaborat Res Team, Green Nanoelect Ctr, Tsukuba, Ibaraki 3058569, JapanNatl Inst Adv Ind Sci & Technol, Collaborat Res Team, Green Nanoelect Ctr, Tsukuba, Ibaraki 3058569, Japan
Soeya, Susumu
Shintani, Toshimichi
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Natl Inst Adv Ind Sci & Technol, Collaborat Res Team, Green Nanoelect Ctr, Tsukuba, Ibaraki 3058569, JapanNatl Inst Adv Ind Sci & Technol, Collaborat Res Team, Green Nanoelect Ctr, Tsukuba, Ibaraki 3058569, Japan
机构:
Shanghai Institute of Micro-System and Information Technology
Shanghai Tech UniversityShanghai Institute of Micro-System and Information Technology
霍如如
蔡道林
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
蔡道林
陈邦明
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
陈邦明
陈一峰
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
陈一峰
王玉婵
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
王玉婵
王月青
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
王月青
魏宏阳
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
魏宏阳
王青
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
王青
夏洋洋
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
夏洋洋
高丹
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
高丹
宋志棠
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Shanghai Institute of Micro-System and Information TechnologyShanghai Institute of Micro-System and Information Technology
机构:
Tecnol Monterrey, Escuela Ingn & Ciencias, Dept Fis & Matemat, Atizapan De Zaragoza 52926, Estado De Mexic, MexicoTecnol Monterrey, Escuela Ingn & Ciencias, Dept Fis & Matemat, Atizapan De Zaragoza 52926, Estado De Mexic, Mexico
Hernandez, Ernesto M.
Otero, Jose A.
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Tecnol Monterrey, Escuela Ingn & Ciencias, Dept Fis & Matemat, Atizapan De Zaragoza 52926, Estado De Mexic, MexicoTecnol Monterrey, Escuela Ingn & Ciencias, Dept Fis & Matemat, Atizapan De Zaragoza 52926, Estado De Mexic, Mexico