A Selective BP/Si Contact Formed by Low-Temperature Plasma-Enhanced Atomic Layer Deposition

被引：0
|
作者：
A. S. Gudovskikh
D. A. Kudryashov
A. I. Baranov
A. V. Uvarov
I. A. Morozov
机构：
[1] Zh.I. Alferov St. Petersburg National Research Academic University,
[2] Russian Academy of Sciences,undefined
[3] St. Petersburg Electrotechnical University “LETI”,undefined
来源：
Technical Physics Letters | 2021年 / 47卷
关键词：
boron phosphide; silicon; selective contact; solar cell.;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：96 / 98
页数：2
相关论文
共 50 条
  • [21] Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
    Suh, Sungin
    Ryu, Seung Wook
    Cho, Seongjae
    Kim, Jun-Rae
    Kim, Seongkyung
    Hwang, Cheol Seong
    Kim, Hyeong Joon
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2016, 34 (01):
  • [22] Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
    Ozgit, Cagla
    Donmez, Inci
    Alevli, Mustafa
    Biyikli, Necmi
    THIN SOLID FILMS, 2012, 520 (07) : 2750 - 2755
  • [23] Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology
    Burke, Micheal
    Blake, Alan
    Povey, Ian M.
    Schmidt, Michael
    Petkov, Nikolay
    Carolan, Patrick
    Quinn, Aidan J.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (03):
  • [24] Hydrogen-mediated low-temperature epitaxy of Si in plasma-enhanced chemical vapor deposition
    Kitagawa, T
    Kondo, M
    Matsuda, A
    APPLIED SURFACE SCIENCE, 2000, 159 : 30 - 34
  • [25] Low-temperature plasma-enhanced atomic layer deposition growth of WNxCy from a novel precursor for barrier applications in nanoscale devices
    Zeng W.
    Wang X.
    Kumar S.
    Peters D.W.
    Eisenbraun E.T.
    J Mater Res, 2007, 3 (703-709): : 703 - 709
  • [26] Low-Temperature Self-Limiting Growth of III-Nitride Thin Films by Plasma-Enhanced Atomic Layer Deposition
    Biyikli, Necmi
    Ozgit, Cagle
    Donmez, Inci
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (10) : 1008 - 1014
  • [27] Silver Thin-Film Electrodes Grown by Low-Temperature Plasma-Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure
    Hasselmann, Tim
    Misimi, Bujamin
    Boysen, Nils
    Zanders, David
    Wree, Jan-Lucas
    Rogalla, Detlef
    Haeger, Tobias
    Zimmermann, Florian
    Brinkmann, Kai Oliver
    Schaedler, Sebastian
    Theirich, Detlef
    Heiderhoff, Ralf
    Devi, Anjana
    Riedl, Thomas
    ADVANCED MATERIALS TECHNOLOGIES, 2023, 8 (01)
  • [28] Low-temperature plasma-enhanced atomic layer deposition growth of WNxCy from a novel precursor for barrier applications in nanoscale devices
    Zeng, Wanxue
    Wang, Xiaodong
    Kumar, Sumit
    Peters, David W.
    Eisenbraun, Eric T.
    JOURNAL OF MATERIALS RESEARCH, 2007, 22 (03) : 703 - 709
  • [29] Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition
    Becker, Martin
    Sierka, Marek
    MATERIALS, 2019, 12 (16)
  • [30] Plasma-enhanced atomic layer deposition of zinc phosphate
    Dobbelaere, T.
    Minjauw, M.
    Ahmad, T.
    Vereecken, P. M.
    Detavernier, C.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2016, 444 : 43 - 48
12345