Sheet Resistance of the TiAlNiAu Thin-Film Metallization of Ohmic Contacts to Nitride Semiconductor Structures

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作者：
N. A. Torkhov
机构：
[1] Scientific and Research Institute of Semiconductors,
[2] Tomsk State University of Control Systems and Radio Electronics,undefined
[3] Tomsk State University,undefined
来源：
Semiconductors | 2019年 / 53卷
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页码：28 / 36
页数：8
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