On the Spreading Resistance of Thin-Film Contacts

被引：37
|
作者：
Zhang, Peng [1 ]
Lau, Y. Y. [1 ]
Timsit, Roland S. [2 ]
机构：
[1] Univ Michigan, Dept Nucl Engn & Radiol Sci, Ann Arbor, MI 48109 USA
[2] Timron Sci Consulting Inc, Toronto, ON M5M 1L6, Canada
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 2012年 / 59卷 / 07期
关键词：
Constriction resistance; contact resistance; electrical contacts; skin depth; spreading resistance; thin films; CONSTRICTION RESISTANCE;
D O I：
10.1109/TED.2012.2195317
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The spreading resistance of a microscopic area of contact (the "alpha-spot") located in a thin film is studied for both Cartesian and cylindrical geometries. The effect of film thickness h on the spreading resistance is evaluated over a large range of aspect ratios. In the limit h -> 0, the normalized thin-film spreading resistance (R) over bar (s) converges to the finite values, i.e., 2.77 for the Cartesian case and 0.28 for the cylindrical case. An interpretation of these limits is given. Extension to a general a-spot geometry is proposed.
引用
收藏
页码：1936 / 1940
页数：5
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