Stable current oscillations accompanying magnetron sputtering of oxide targets

被引：0
|
作者：
A. Kh. Abduev
A. M. Magomedov
机构：
[1] Institute of Physics,
[2] Dagestan Scientific Center,undefined
来源：
Technical Physics Letters | 1998年 / 24卷
关键词：
Oxide; Oxygen; Atomic Oxygen; Magnetron Sputtering; Continuous Generation;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Undamped total current oscillations were observed for the first time during dc magnetron sputtering of oxide ceramic targets. It was shown that these oscillations were caused by the continuous generation of atomic oxygen as a result of chemisorption-desorption processes at the surface of the target heated by ion bombardment. Oscillations of an attachment nature (similar to Trichel oscillations) were observed at low pressures (P=4×10−4 Torr).
引用
收藏
页码：192 / 193
页数：1
相关论文
共 50 条
  • [1] Stable current oscillations accompanying magnetron sputtering of oxide targets
    Abduev, AK
    Magomedov, AM
    TECHNICAL PHYSICS LETTERS, 1998, 24 (03) : 192 - 193
  • [2] Stable current oscillations accompanying magnetron sputtering of oxide targets
    Abduev, A. K.
    Magomedov, A. M.
    Technical Physics Letters, 24 (03):
  • [3] Zinc oxide targets for magnetron sputtering PVD prepared by plasma spray
    Tului, Mario
    Bellucci, Alessandra
    Albolino, Augusto
    Migliozzi, Giuseppe
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 (04): : 1070 - 1073
  • [4] Thermal oxidation annealing on nanovanadium oxide thin film deposited by direct current facing targets magnetron sputtering
    Liang, Ji-Ran
    Hu, Ming
    Chen, Tao
    Liu, Zhi-Gang
    Tianjin Daxue Xuebao (Ziran Kexue yu Gongcheng Jishu Ban)/Journal of Tianjin University Science and Technology, 2009, 42 (08): : 721 - 726
  • [5] Reactive direct current magnetron sputtering of aluminum oxide coatings
    Sproul, W.D.
    Graham, M.E.
    Wong, M.S.
    Lopez, S.
    Li, D.
    Scholl, R.A.
    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1995, 13 (03): : 1188 - 1191
  • [6] Plasma properties of YBaCuO oxide films by rf facing targets magnetron sputtering
    Choi, CS
    Ebihara, K
    Park, BK
    Seong, NJ
    Lee, KS
    Lee, DC
    PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON PROPERTIES AND APPLICATIONS OF DIELECTRIC MATERIALS, VOLS 1 AND 2, 1997, : 589 - 591
  • [7] Characterization of copper oxide nanolayers deposited by direct current magnetron sputtering
    Rastkar, A. R.
    Niknam, A. R.
    Shokri, B.
    THIN SOLID FILMS, 2009, 517 (18) : 5464 - 5467
  • [8] Ring etching zones on magnetron sputtering targets
    Golan, G
    Axelevitch, A
    THIN SOLID FILMS, 1997, 300 (1-2) : 72 - 77
  • [9] Magnetron Sputtering Targets Made of a Resistance Alloy
    Kolesnikova, I. G.
    Serba, V. I.
    Kuz'mich, Yu. V.
    Freidin, B. M.
    Korotkov, V. G.
    Voronchuk, S. I.
    RUSSIAN METALLURGY, 2007, (04): : 344 - 346
  • [10] REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING OF ALUMINUM-OXIDE COATINGS
    SPROUL, WD
    GRAHAM, ME
    WONG, MS
    LOPEZ, S
    LI, D
    SCHOLL, RA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03): : 1188 - 1191
12345