Influence of laser fluence and irradiation timing of F2 laser on ablation properties of fused silica in F2-KrF excimer laser multi-wavelength excitation process

被引:0
|
作者
K. Obata
K. Sugioka
T. Akane
N. Aoki
K. Toyoda
K. Midorikawa
机构
[1] RIKEN (The Institute of Physical and Chemical Research),
[2] Hirosawa 2-1,undefined
[3] Wako,undefined
[4] Saitama 351-0198,undefined
[5] Japan,undefined
[6] Department of Applied Electronics,undefined
[7] Science University of Tokyo,undefined
[8] Yamazaki 2641,undefined
[9] Noda,undefined
[10] Chiba 278-8510,undefined
[11] Japan,undefined
来源
Applied Physics A | 2001年 / 73卷
关键词
PACS: 42.62.-b; 42.70.Ce; 81.65.Cf;
D O I
暂无
中图分类号
学科分类号
摘要
A collinear irradiation system of F2 and KrF excimer lasers for high-quality and high-efficiency ablation of hard materials by the F2 and KrF excimer lasers’ multi-wavelength excitation process has been developed. This system achieves well-defined micropatterning of fused silica with little thermal influence and little debris deposition. In addition, the dependence of ablation rate on various conditions such as laser fluence, irradiation timing of each laser beam, and pulse number is examined to investigate the role of the F2 laser in this process. The multi-wavelength excitation effect is strongly affected by the irradiation timing, and an extremely high ablation rate of over 30 nm/pulse is obtained between -10 ns and 10 ns of the delay time of F2 laser irradiation. The KrF excimer laser ablation threshold decreases and its effective absorption coefficient increases with increasing F2 laser fluence. Moreover, the ablation rate shows a linear increase with the logarithm of KrF excimer laser fluence when the F2 laser is simultaneously irradiated, while single KrF excimer laser ablation shows a nonlinear increase. The ablation mechanism is discussed based on these results.
引用
收藏
页码:755 / 759
页数:4
相关论文
共 50 条
  • [41] Surface properties of polymers treated with F2 laser
    Reznickova, A.
    Chaloupka, A.
    Heitz, J.
    Kolska, Z.
    Svorcik, V.
    SURFACE AND INTERFACE ANALYSIS, 2012, 44 (03) : 296 - 300
  • [42] The influence of CO2 laser local irradiation on the laser damage resistance of fused silica
    Liu Chun-Ming
    Yang Liang
    Yan Zhong-Hua
    Jiang Yong
    Wang Hai-Jun
    Liao Wei
    Xiang Xia
    He Shao-Bo
    Lu Hai-Bin
    Yuan Xiao-Dong
    Zheng Wan-Guo
    Zu Xiao-Tao
    ACTA PHYSICA SINICA, 2013, 62 (09)
  • [43] Efficient excitation conditions for an electric-discharge F2 laser
    Atezhev, VV
    Vartapetov, SK
    Zhukov, AN
    Kurzanov, MA
    Obidin, AZ
    Yamshchikov, VA
    QUANTUM ELECTRONICS, 2003, 33 (08) : 677 - 683
  • [44] Extending the performance of KrF laser for microlithography by using novel F2 control technology
    Zambon, P
    Gong, MX
    Carlesi, J
    Padmabandu, GG
    Binder, M
    Swanson, K
    Das, P
    OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2, 2000, 4000 : 1461 - 1470
  • [45] F2 excimer laser (157 nm) ablation of polymers:: relation of neutral and ionic fragment detection and absorption
    Kuhnke, M.
    Cramer, L.
    Dyer, P. E.
    Dickinson, J. T.
    Lippert, T.
    Niino, H.
    Pervolaraki, M.
    Walton, C. D.
    Wokaun, A.
    COLA'05: 8TH INTERNATIONAL CONFERENCE ON LASER ABLATION, 2007, 59 : 625 - +
  • [46] Efficient refractive-index modification of fused silica by a resonance-photoionization-like process using F2 and KrF excimer lasers
    Obata, K
    Sugioka, K
    Akane, T
    Midorikawa, K
    Aoki, N
    Toyoda, K
    OPTICS LETTERS, 2002, 27 (05) : 330 - 332
  • [47] Effects of F6- ions and F2 molecules on the oscillation process of a discharge-pumped ArF excimer laser
    Nagai, S
    Sakai, M
    Furuhashi, H
    Kono, A
    Goto, T
    Uchida, Y
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1998, 34 (01) : 40 - 46
  • [48] SiO2 humps formed on silicone rubber by F2 laser irradiation
    Takao, H
    Okoshi, M
    Inoue, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (03): : 1284 - 1287
  • [49] The feature of laser ablation of fused and crystal silica and natural silicates induced by pulsed CO2 laser irradiation
    Mukhamedgalieva, AF
    Bondar, AM
    Ionin, AA
    Klimachev, YM
    Sinitsyn, DV
    Zvorykin, VD
    HIGH-POWER LASER ABLATION V, PTS 1 AND 2, 2004, 5448 : 987 - 991
  • [50] SUB-MICRON, VACUUM ULTRAVIOLET CONTACT LITHOGRAPHY WITH AN F2 EXCIMER LASER
    WHITE, JC
    CRAIGHEAD, HG
    HOWARD, RE
    JACKEL, LD
    BEHRINGER, RE
    EPWORTH, RW
    HENDERSON, D
    SWEENEY, JE
    APPLIED PHYSICS LETTERS, 1984, 44 (01) : 22 - 24