The influence of CO2 laser local irradiation on the laser damage resistance of fused silica

被引:2
|
作者
Liu Chun-Ming [1 ]
Yang Liang [1 ]
Yan Zhong-Hua [1 ]
Jiang Yong [1 ]
Wang Hai-Jun [2 ]
Liao Wei [2 ]
Xiang Xia [1 ]
He Shao-Bo [2 ]
Lu Hai-Bin [2 ]
Yuan Xiao-Dong [2 ]
Zheng Wan-Guo [2 ]
Zu Xiao-Tao [1 ]
机构
[1] Univ Elect Sci & Technol China, Sch Phys Elect, Chengdu 610054, Peoples R China
[2] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China
基金
中国国家自然科学基金; 国家高技术研究发展计划(863计划);
关键词
CO2 laser local irradiation; fused silica; laser damage resistance;
D O I
10.7498/aps.62.094701
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The influence of CO2 laser local irradiation (CLLI) on the laser damage resistance of fused silica was studied. It is found that CLLI has no evident effect on the laser-induced damage threshold (LIDT) of fused silica when the temperature of irradiation center is low (1139 K). However, the influence of CLLI on LIDT becomes important when the temperature of irradiation center is higher (1638 K). AT first, LIDT decreases with r increasing from zero to r(M), where r is the distance to irradiation center, and r(M) is the distance at which the residual stress-induced phase retardance reaches the maximum. Then, LIDT increases a little when r is larger than r(M). The origin of this phenomenon is discussed. Due to the residual stress, re-initiated damage in irradiation region can result in the formation of fractures. The fractures due to the re-initiated damage at irradiation center transport along radial direction firstly, and then transport along the tangential direction near r(M). This may be due to the maximum tensile hoop stress and radial stress dependence of radius. Cares should be taken for the optical cleaning when thermal oven annealing is used to eliminate the residual stress. Otherwise, crystallization can be induced by contamination during annealing. The contamination also has negative impact on the light transmission and LIDT.
引用
收藏
页数:6
相关论文
共 15 条
  • [1] Results of applying a non-evaporative mitigation technique to laser-initiated surface damage on fused-silica
    Adams, J. J.
    Bolourchi, M.
    Bude, J. D.
    Guss, G. M.
    Matthews, M. J.
    Nostrand, M. C.
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2010, 2010, 7842
  • [2] An Improved Method of Mitigating Laser Induced Surface Damage Growth in Fused Silica Using a Rastered, Pulsed CO2 Laser
    Bass, Isaac L.
    Guss, Gabriel M.
    Nostrand, Michael J.
    Wegner, Paul J.
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2010, 2010, 7842
  • [3] Burnham A K, 2002, UCRLJC144298 LAWR LI
  • [4] Mitigation of laser damage on fused silica surfaces with a variable profile CO2 laser beam
    During, Annelise
    Bouchut, Philippe
    Coutar, Jean-Guillaume
    Leymarie, Christophe
    Bercegol, Herve
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2006, 2007, 6403
  • [5] Feit M D, 2002, UCRLJC148580 LAWR LI
  • [6] Investigation of stress induced by CO2 laser processing of fused silica optics for laser damage growth mitigation
    Gallais, Laurent
    Cormont, Philippe
    Rullier, Jean-Luc
    [J]. OPTICS EXPRESS, 2009, 17 (26): : 23488 - 23501
  • [7] Mitigation of growth of laser initiated surface damage in fused silica using a 4.6μm wavelength laser
    Guss, Gabe
    Bassa, Isaac
    Draggoo, Vaughn
    Hackel, Richard
    Payne, Steve
    Lancaster, Mark
    Mak, Paul
    [J]. LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2006, 2007, 6403
  • [8] Li L, 2011, CHIN PHYS B, V20
  • [9] The Structure Evolution of Fused Silica Induced by CO2 Laser Irradiation
    Liu Chun-Ming
    Jiang Yong
    Luo Cheng-Si
    Shi Xiao-Yan
    Ren Wei
    Xiang Xia
    Wang Hai-Jun
    He Shao-Bo
    Yuan Xiao-Dong
    Lv Hai-Bing
    Zheng Wan-Guo
    Zu Xiao-Tao
    [J]. CHINESE PHYSICS LETTERS, 2012, 29 (04)
  • [10] Effect of thermal stresses on fused silica surface on the laser induced damage
    Liu Hong-Jie
    Huang Jin
    Wang Feng-Rui
    Zhou Xin-Da
    Jiang Xiao-Dong
    Wu Wei-Dong
    [J]. ACTA PHYSICA SINICA, 2010, 59 (02) : 1308 - 1313