Formation of nanostructures on the surface of polymer films by an atomic force microscope tip

The formation of nanostructures on the surface of polymer films by the tip of an atomic force microscope under a large load was investigated. It was shown that, depending on the kind of polymer used, one can fabricate both nanocraters due to the applied pressure exceeding the limit of the material elasticity (PMMA, polystyrene) and convex nanostructures (positive photoresist). The latter can be formed due to the strong adhesion tension exceeding the photoresist tensile strength. The diameter of the convex structures was 80–100 nm and their height was 2–3 nm.