X-ray phase analysis of copper oxides films obtained by DC reactive magnetron sputtering

被引：0
|
作者：
A. E. Lapshin
V. V. Karzin
V. I. Shapovalov
P. B. Baikov
机构：
[1] Russian Academy of Sciences,Institute of Silicate Chemistry
[2] St. Petersburg Electrotechnical University LETI,undefined
来源：
Glass Physics and Chemistry | 2016年 / 42卷
关键词：
films; copper oxides; reactive magnetron sputtering method; X-ray phase analysis;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The phase composition of the copper oxides films obtained by DC reactive magnetron sputtering at oxygen partial pressures of 0.06, 0.10, and 0.16 mTorr is studied by X-ray phase analysis (XRPA) before and after their heat treatment within the range 300–550°C. It is found that the original phase compositions of the films of each lot are different; after the heat treatment at 550°C, all the films contained only CuO of a monoclinic structure.
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页码：116 / 117
页数：1
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