The level set method for etching and deposition

被引：3
|
作者：
Adalsteinsson, D [1 ]
Evans, LC
Ishii, H
机构：
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Math, Berkeley, CA 94720 USA
[3] Tokyo Metropolitan Univ, Dept Math, Hachioji, Tokyo 19203, Japan
来源：
MATHEMATICAL MODELS & METHODS IN APPLIED SCIENCES | 1997年 / 7卷 / 08期
关键词：
D O I：
10.1142/S0218202597000578
中图分类号：
O29 [应用数学];
学科分类号：
070104 ;
摘要：
We provide a rigorous interpretation of the level set approach to certain nonlocal geometric motions modelling etching effects in manufacture. The shadowing of certain parts of a surface by other parts gives rise to a nonlocal Hamilton-Jacobi type PDE, with a multivalued Hamiltonian. We also show that deposition effects do not fall within the conventional level set framework, and accordingly must be reinterpreted for numerical implementation.
引用
收藏
页码：1153 / 1186
页数：34
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