The level set method for etching and deposition

被引：3

作者：

Adalsteinsson, D ^{[1
]}

Evans, LC

Ishii, H

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept Math, Berkeley, CA 94720 USA

[3] Tokyo Metropolitan Univ, Dept Math, Hachioji, Tokyo 19203, Japan

来源：

MATHEMATICAL MODELS & METHODS IN APPLIED SCIENCES | 1997年 / 7卷 / 08期

关键词：

D O I：

10.1142/S0218202597000578

中图分类号：

O29 [应用数学];

学科分类号：

070104 ;

摘要：

We provide a rigorous interpretation of the level set approach to certain nonlocal geometric motions modelling etching effects in manufacture. The shadowing of certain parts of a surface by other parts gives rise to a nonlocal Hamilton-Jacobi type PDE, with a multivalued Hamiltonian. We also show that deposition effects do not fall within the conventional level set framework, and accordingly must be reinterpreted for numerical implementation.

引用

页码：1153 / 1186

页数：34

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