共 50 条
- [1] Numerical simulations of sputter deposition and etching in trenches using the level set technique [J]. 1999 INTERNATIONAL CONFERENCE ON MODELING AND SIMULATION OF MICROSYSTEMS, 1999, : 449 - 451
- [2] Numerical simulations of topographic evolution for sputter deposition into trenches and vias [J]. ADVANCED INTERCONNECTS AND CONTACTS, 1999, 564 : 313 - 319
- [4] The level set method for etching and deposition [J]. MATHEMATICAL MODELS & METHODS IN APPLIED SCIENCES, 1997, 7 (08): : 1153 - 1186
- [5] SELF-LIMITING ETCH DEPTHS USING SIMULTANEOUS SPUTTER ETCHING DEPOSITION TECHNIQUE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 470 - 473
- [6] Novel Numerical Dissipation Scheme for Level-Set Based Anisotropic Etching Simulations [J]. 2019 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES (SISPAD 2019), 2019, : 327 - 330
- [8] On the topography simulation of memory cell trenches for semiconductor manufacturing deposition processes using the level set method [J]. MODELLING AND SIMULATION 2002, 2002, : 653 - 660