Activation energies for deprotection reaction of chemically amplified resists : A study using in-situ FT-IR spectroscopy

被引：8
|
作者：
Shinozuka, T [1 ]
Tsunooka, M
Itani, T
Shirai, M
机构：
[1] Univ Osaka Prefecture, Grad Sch Engn, Dept Appl Chem, Sakai, Osaka 5998531, Japan
[2] Semicond Leading Edge Technol Inc, Tsukuba, Ibaraki 3058569, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2002年 / 15卷 / 05期
关键词：
deprotection reaction; photoresist; activation energy; in-situ FT-IR;
D O I：
10.2494/photopolymer.15.765
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：765 / 768
页数：4
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