Studies on electrodeposited nanometric Co/Cu multilayers

被引：3
|
作者：
Gupta, Priyanka [1 ]
Shivagan, D. D. [1 ]
Pandya, Dinesh K. [1 ]
Kashyap, Subhash C. [1 ]
Chaudhary, Sweet [1 ]
机构：
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
来源：
INTERNATIONAL JOURNAL OF NANOSCIENCE, VOL 5, NOS 4 AND 5 | 2006年 / 5卷 / 4-5期
关键词：
magnetic multilayers; magnetoresistance; cyclic voltammetry;
D O I：
10.1142/S0219581X0600470X
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Co/Cumultilayers were electrodeposited in potentiostatic mode, using two different sulphate baths, one without any additive and other containing trisodium citrate. Deposition parameters, like deposition potential and deposition time, were established for both the baths by carrying out a series of cyclic voltammetry and chronoamperometric experiments. Thin films, having 2-20 bilayers, were electrodeposited under the established parameters. It was observed that films deposited from bath containing trisodium citrate were comparatively much smoother than films deposited from additive free bath. The films with 20 bilayers, deposited from additive free bath, exhibited a room temperature magnetoresistance of 1.5% at 9 kG, whereas magnetoresistance value enhanced to up to 5.6% at 9 kG for films deposited from trisodium citrate bath for same number of bilayers.
引用
收藏
页码：505 / +
页数：2
相关论文
共 50 条
  • [41] Giant magnetoresistance in electrodeposited Co-Cu/Cu multilayers: Origin of the absence of oscillatory behavior
    Bakonyi, I.
    Simon, E.
    Toth, B. G.
    Peter, L.
    Kiss, L. F.
    [J]. PHYSICAL REVIEW B, 2009, 79 (17)
  • [42] Growth, characterization and magnetoresistive study of electrodeposited Ni/Cu and Co-Ni/Cu multilayers
    Nabiyouni, G.
    Schwarzacher, W.
    [J]. JOURNAL OF CRYSTAL GROWTH, 2005, 275 (1-2) : E1259 - E1262
  • [43] Formation and nanomechanical properties of intermetallic compounds in electrodeposited Cu–Sn–Co multilayers
    Yi Sing Goh
    Yingxin Goh
    Pay Ying Chia
    A. S. M. A. Haseeb
    [J]. Journal of Materials Science: Materials in Electronics, 2021, 32 : 9490 - 9499
  • [44] Correlation between structural imperfection and giant magnetoresistance in electrodeposited Co/Cu multilayers
    Shima, M
    Salamanca-Riba, LG
    McMichael, RD
    Moffat, TP
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (08) : C518 - C523
  • [45] Magnetoresistance and Surface Roughness Study of the Initial Growth of Electrodeposited Co/Cu Multilayers
    Toth, B. G.
    Peter, L.
    Bakonyi, I.
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011, 158 (11) : D671 - D680
  • [46] Preparation, Structure and Giant Magnetoresistance of Electrodeposited Fe-Co/Cu Multilayers
    Toth, B. G.
    Peter, L.
    Pogany, L.
    Revesz, A.
    Bakonyi, I.
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2014, 161 (04) : D154 - D162
  • [47] GIANT MAGNETORESISTANCE OF ELECTRODEPOSITED CONICU/CU MULTILAYERS
    HUA, SZ
    SALAMANCARIBA, L
    BENNETT, LH
    SWARTZENDRUBER, LJ
    MCMICHAEL, RD
    LASHMORE, DS
    SCHLESINGER, M
    [J]. SCRIPTA METALLURGICA ET MATERIALIA, 1995, 33 (10-11): : 1643 - 1646
  • [48] Giant Magnetoresistance and Structure of Electrodeposited Co/Cu Multilayers: The Influence of Layer Thicknesses and Cu Deposition Potential
    Rajasekaran, N.
    Mani, J.
    Toth, B. G.
    Molnar, G.
    Mohan, S.
    Peter, L.
    Bakonyi, I.
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2015, 162 (06) : D204 - D212
  • [49] Optimisation of electrochemical process parameters for giant magnetoresistance of electrodeposited Ni-Co(Cu)/Cu multilayers
    Dulal, S. M. S. I.
    Charles, E. A.
    [J]. TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 2008, 86 (05): : 260 - 266
  • [50] Preparation and characterisation of electrodeposited Ni-Cu/Cu multilayers
    Alper, M
    Baykul, MC
    Péter, L
    Tóth, J
    Bakonyi, I
    [J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 2004, 34 (08) : 841 - 848
12345