Studies on electrodeposited nanometric Co/Cu multilayers

被引：3
|
作者：
Gupta, Priyanka [1 ]
Shivagan, D. D. [1 ]
Pandya, Dinesh K. [1 ]
Kashyap, Subhash C. [1 ]
Chaudhary, Sweet [1 ]
机构：
[1] Indian Inst Technol, Dept Phys, Thin Film Lab, New Delhi 110016, India
来源：
INTERNATIONAL JOURNAL OF NANOSCIENCE, VOL 5, NOS 4 AND 5 | 2006年 / 5卷 / 4-5期
关键词：
magnetic multilayers; magnetoresistance; cyclic voltammetry;
D O I：
10.1142/S0219581X0600470X
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Co/Cumultilayers were electrodeposited in potentiostatic mode, using two different sulphate baths, one without any additive and other containing trisodium citrate. Deposition parameters, like deposition potential and deposition time, were established for both the baths by carrying out a series of cyclic voltammetry and chronoamperometric experiments. Thin films, having 2-20 bilayers, were electrodeposited under the established parameters. It was observed that films deposited from bath containing trisodium citrate were comparatively much smoother than films deposited from additive free bath. The films with 20 bilayers, deposited from additive free bath, exhibited a room temperature magnetoresistance of 1.5% at 9 kG, whereas magnetoresistance value enhanced to up to 5.6% at 9 kG for films deposited from trisodium citrate bath for same number of bilayers.
引用
收藏
页码：505 / +
页数：2
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