Radiation and photochemistry of onium salt acid generators in chemically amplified resists

被引：149
|
作者：
Tagawa, S [1 ]
Nagahara, S [1 ]
Iwamoto, T [1 ]
Wakita, M [1 ]
Kozawa, T [1 ]
机构：
[1] Osaka Univ, ISIR, Ibaraki, Osaka 5670047, Japan
来源：
ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷
关键词：
sulfonium salt; acid generator; radiation chemistry; photochemistry; in-cage reaction; flash photolysis; pulse radiolysis;
D O I：
10.1117/12.388304
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The difference in photochemistry and radiation chemistry of sulfoniun salt acid generator was investigated by product analysis and time resolved spectroscopic methods for chemically amplified resist application After KrF excimer laser and electron beam irradiation of sulfonium salt yields of decomposed products including acid were determined. The ultra fast in-cage reactions after laser irradiation were directly observed by the femtosecond laser flash photolysis method. Intermediates after electron beam irradiation were observed by nanosecond electron beam pulse radiolysis. From both the product analysis and time resolved spectroscopic methods, the contribution of each reaction pathway to acid generation was determined.
引用
收藏
页码：204 / 213
页数：4
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