共 50 条
- [1] ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESISTS [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 93 - PMSE
- [2] Acid diffusion control in chemically amplified resists [J]. POLYMER, 1999, 40 (04) : 1087 - 1089
- [3] Acid diffusion and evaporation in chemically amplified resists [J]. MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 536 - 543
- [5] Lithographic effects of acid diffusion in chemically amplified resists [J]. MICROELECTRONICS TECHNOLOGY: POLYMERS FOR ADVANCED IMAGING AND PACKAGING, 1995, 614 : 56 - 68
- [6] Lithographic importance of acid diffusion in chemically amplified resists [J]. Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 269 - 280
- [7] LITHOGRAPHIC EFFECTS OF ACID DIFFUSION IN CHEMICALLY AMPLIFIED RESISTS [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 92 - PMSE
- [8] Diffusion and resolution for chemically amplified resists [J]. MICROLITHOGRAPHY WORLD, 2006, 15 (03): : 17 - 18
- [9] Experimental method for quantifying acid diffusion in chemically amplified resists [J]. MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 138 - 148