Ion-induced magnetic texturing of Ni films: Domain structure and strain

被引：7
|
作者：
Zhang, K. [1 ]
Lieb, K. P.
Merkel, D. G.
Uhrmacher, M.
Pilet, N.
Ashworth, T. V.
Hug, H. J.
机构：
[1] Univ Gottingen, Inst Phys 2, D-37077 Gottingen, Germany
[2] Univ Gottingen, SFB 602, D-37077 Gottingen, Germany
[3] Univ Basel, Inst Phys, CH-4056 Basel, Switzerland
[4] EMPA, Swiss Fed Lab Mat Testing & Res, CH-8600 Dubendorf, Switzerland
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 257卷 / 1-2 SPEC. ISS.期
关键词：
heavy ion implantation; magnetization; magnetic force microscopy;
D O I：
10.1016/j.nimb.2007.01.032
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Ion-irradiation of ferromagnetic films induces pronounced changes of their microstructure and micromagnetism. The present study is devoted to the changes in the domain structure in 65-75 nm electron-evaporated polycrystalline Ni films due to 200-keV Xe+ or 100-keV Ni+ implantation. For magnetic analysis, we combined magnetic force microscopy (MFM) and magneto-optical Kerr effect (MOKE); X-ray diffraction and Rutherford back-scattering spectroscopy served to characterize the microstructure of the films. After deposition, MFM indicated a pattern of magnetic ripples (with in-plane and perpendicular components of the magnetization). After ion irradiation, MOKE showed almost total in-plane remanence, and MFM confirmed the disappearance of the ripples at room temperature. The magnetic properties were correlated with the ion-induced changes in the strain in the as-deposited and ion-irradiated films. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码：379 / 382
页数：4
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