Damascene metal gate for 70nm CMOS process

被引：0
|
作者：
Guillaumot, B [1 ]
Ducroquet, F [1 ]
Ernst, T [1 ]
Guegan, G [1 ]
Galon, C [1 ]
Renard, C [1 ]
Prévitali, B [1 ]
Rivoire, M [1 ]
Nier, ME [1 ]
Tedesco, S [1 ]
Fargeot, T [1 ]
Achard, H [1 ]
Deleopibus, S [1 ]
机构：
[1] CEA, LETI, DTS, F-38054 Grenoble, France
来源：
SEMICONDUCTOR SILICON 2002, VOLS 1 AND 2 | 2002年 / 2002卷 / 02期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：793 / 802
页数：10
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