Towards Non-Degenerate Quantum Lithography

被引：0
|
作者：
Zhou, Yu [1 ]
Peng, Tao [2 ]
Chen, Hui [3 ,4 ]
Liu, Jianbin [3 ,4 ]
Shih, Yanhua [5 ]
机构：
[1] Xi An Jiao Tong Univ, Dept Appl Phys, MOE Key Lab Nonequilibrium Synth & Modulat Conden, Xian 710049, Shaanxi, Peoples R China
[2] Texas A&M Univ, Inst Quantum Sci & Engn, College Stn, TX 77843 USA
[3] Xi An Jiao Tong Univ, Elect Mat Res Lab, Minist Educ, Key Lab,Sch Elect & Informat Engn, Xian 710049, Shaanxi, Peoples R China
[4] Xi An Jiao Tong Univ, Int Ctr Dielect Res, Sch Elect & Informat Engn, Xian 710049, Shaanxi, Peoples R China
[5] Univ Maryland, Dept Phys, Baltimore, MD 21250 USA
来源：
APPLIED SCIENCES-BASEL | 2018年 / 8卷 / 08期
基金：
中国国家自然科学基金;
关键词：
quantum lithography; entangled photon pairs; quantum imaging; MACH-ZEHNDER INTERFEROMETER; 2-PHOTON INTERFERENCE; BROGLIE WAVELENGTH; DIFFRACTION;
D O I：
10.3390/app8081292
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young's double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments.
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页数：7
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