A precise two-dimensional subthreshold current and capacitance modeling of short-channel, nanoscale double-gate MOSFETs is presented. The model covers a wide range of geometries and material combinations. The subthreshold model is based on conformal mapping techniques. The results are in excellent agreement with numerical simulations. (C) 2009 Elsevier Ltd. All rights reserved.
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Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-221005,IndiaDepartment of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-221005,India
Sarvesh Dubey
Pramod Kumar Tiwari
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Department of Electronics and Communication Engineering,National Institute of Technology Rourkela-769008,IndiaDepartment of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-221005,India
Pramod Kumar Tiwari
S.Jit
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Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-221005,IndiaDepartment of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-221005,India
机构:
Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-,India Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-,India
Sarvesh Dubey
Pramod Kumar Tiwari
论文数: 0引用数: 0
h-index: 0
机构:
Department of Electronics and Communication Engineering,National Institute of Technology Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-,India
Pramod Kumar Tiwari
SJit
论文数: 0引用数: 0
h-index: 0
机构:
Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-,India Department of Electronics Engineering,Indian Institute of Technology(BHU),Varanasi-,India