Transmittance and resistivity of semicontinuous copper films prepared by pulsed-laser deposition

被引:13
|
作者
So, SK [1 ]
Fong, HH [1 ]
Yeung, CF [1 ]
Cheung, NH [1 ]
机构
[1] Hong Kong Baptist Univ, Dept Phys, Hong Kong, Hong Kong, Peoples R China
关键词
D O I
10.1063/1.1289259
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin copper films were grown on glass by pulsed-laser deposition. The simultaneous in situ monitoring of the electrical resistance and optical transmittance of the growing film yielded highly reproducible and consistent data about percolation onset and film conductivity, both being useful indicators of film quality. When prepared under favorable conditions, films as thin as 1.5 nm would percolate, and became fully continuous at 5 nm, with conductivity reaching 30% of that of bulk copper. (C) 2000 American Institute of Physics. [S0003-6951(00)00234-5].
引用
收藏
页码:1099 / 1101
页数:3
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