Nanopillar Fabrication with Focused Ion Beam Cutting

被引：12

作者：

Kuzmin, Oleksii V. ^{[1
]}

Pei, Yutao T. ^{[1
]}

De Hosson, Jeff T. M. ^{[1
]}

机构：

[1] Univ Groningen, Mat Innovat Inst M2i, Dept Appl Phys, Zernike Inst Adv Mat, NL-9747 AG Groningen, Netherlands

来源：

MICROSCOPY AND MICROANALYSIS | 2014年 / 20卷 / 05期

关键词：

nanopillars; focused ion beam; metallic glass; TEM; METALLIC-GLASS; SIZE; MICROSCOPY;

D O I：

10.1017/S1431927614001032

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A versatile method to fabricate taper-free micro-/nanopillars of large aspect ratio was developed with focused ion beam (FIB) cutting. The key features of the fabrication are a FIB with an incident angle of 90 degrees to the long axis of the pillar that enables milling of the pillar sideways avoiding tapering and the FIB current can be reduced step by step so as to reduce possible radiation damage of the milled surface by Ga ions. A procedure to accurately determine the cross-section of each pillar was developed.

引用

页码：1581 / 1584

页数：4

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