Chemical surface modification via radical C-C bond-forming reactions

被引:24
|
作者
Siegenthaler, Kai Oliver
Schaefer, Andreas
Studer, Armido
机构
[1] Univ Munster, Fachbereich Chem, Inst Organ Chem, D-48149 Munster, Germany
[2] NanoAnalyt GMBH, D-48149 Munster, Germany
关键词
D O I
10.1021/ja0686716
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Radical C-C bond-forming reactions at self-assembled monolayers (SAMs) can be used for the modification of alkene terminated Si wafers under neutral conditions. Many functional groups are tolerated under radical conditions and biologically interesting molecules such as biotin can be immobilized via this approach.
引用
收藏
页码:5826 / +
页数:3
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