Chemical surface modification via radical C-C bond-forming reactions

被引：24

作者：

Siegenthaler, Kai Oliver

Schaefer, Andreas

Studer, Armido

机构：

[1] Univ Munster, Fachbereich Chem, Inst Organ Chem, D-48149 Munster, Germany

[2] NanoAnalyt GMBH, D-48149 Munster, Germany

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 129卷 / 18期

关键词：

D O I：

10.1021/ja0686716

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Radical C-C bond-forming reactions at self-assembled monolayers (SAMs) can be used for the modification of alkene terminated Si wafers under neutral conditions. Many functional groups are tolerated under radical conditions and biologically interesting molecules such as biotin can be immobilized via this approach.

引用

页码：5826 / +

页数：3

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