Minimal zone plates for x-ray lithography

被引:2
|
作者
Amy, D [1 ]
Jiang, L
Zheng, R
Feldman, M
Cerrina, F
Dhuey, S
Leonard, Q
Thielman, D
机构
[1] Louisiana State Univ, Baton Rouge, LA 70803 USA
[2] Univ Wisconsin, Madison, WI 53706 USA
来源
关键词
D O I
10.1116/1.1809625
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As feature widths in integrated circuits continue to decrease, patterning the smallest features has become more and more challenging. This is especially true for contact levels, where vias less than 50 nm diameter will be extremely difficult to print. However, since vias are typically well separated, they are readily patterned by using zone plates to focus x rays. Although zone plates have been used to focus x rays to small, spots for many years, it has generally been considered necessary to have more than about 10 zones to produce clean images, i.e., with minimal energy in the side lobes. However, we have found that zone plates useful for x-ray lithography may have small numerical apertures and as few as two zones, and still produce very small and clean images. (C) 2004 American Vacuum Society.
引用
收藏
页码:3570 / 3574
页数:5
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