Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

被引：12
|
作者：
Liu, Longhua [1 ]
Liu, Gang [1 ]
Xiong, Ying [1 ]
Chen, Jie [1 ]
Kang, Chunlei [1 ]
Huang, Xinlong [1 ]
Tian, Yangchao [1 ]
机构：
[1] Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230029, Anhui, Peoples R China
来源：
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2008年 / 14卷 / 9-11期
关键词：
D O I：
10.1007/s00542-007-0542-7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
High focusing efficiency Fresnel zone plates for hard X-ray imaging is fabricated by electron beam lithography, soft X-ray lithography, and gold electroplating techniques. Using the electron beam lithography, Fresnel zone plates which has an outermost zone width of 100 nm and thickness of 250 nm has been fabricated. Fresnel zone plates with outermost zone width of 150 nm and thickness of 660 nm has been fabricated by using soft X-ray lithography.
引用
收藏
页码：1251 / 1255
页数：5
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