Minimal zone plates for x-ray lithography

被引:2
|
作者
Amy, D [1 ]
Jiang, L
Zheng, R
Feldman, M
Cerrina, F
Dhuey, S
Leonard, Q
Thielman, D
机构
[1] Louisiana State Univ, Baton Rouge, LA 70803 USA
[2] Univ Wisconsin, Madison, WI 53706 USA
来源
关键词
D O I
10.1116/1.1809625
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
As feature widths in integrated circuits continue to decrease, patterning the smallest features has become more and more challenging. This is especially true for contact levels, where vias less than 50 nm diameter will be extremely difficult to print. However, since vias are typically well separated, they are readily patterned by using zone plates to focus x rays. Although zone plates have been used to focus x rays to small, spots for many years, it has generally been considered necessary to have more than about 10 zones to produce clean images, i.e., with minimal energy in the side lobes. However, we have found that zone plates useful for x-ray lithography may have small numerical apertures and as few as two zones, and still produce very small and clean images. (C) 2004 American Vacuum Society.
引用
收藏
页码:3570 / 3574
页数:5
相关论文
共 50 条
  • [41] X-RAY LITHOGRAPHY
    SMITH, HI
    FLANDERS, DC
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 : 61 - 65
  • [42] Direct-write X-ray lithography using a hard X-ray Fresnel zone plate
    Lee, Su Yong
    Noh, Do Young
    Lee, Hae Cheol
    Yu, Chung-Jong
    Hwu, Yeukuang
    Kang, Hyon Chol
    JOURNAL OF SYNCHROTRON RADIATION, 2015, 22 : 781 - 785
  • [43] FOCUSING CHARACTERISTICS OF X-RAY ZONE PLATES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY AND REACTIVE ION ETCHING
    ARITOME, H
    AOKI, H
    NAMBA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (06): : L406 - L408
  • [44] FABRICATION OF HARD X-RAY PHASE ZONE-PLATE BY X-RAY-LITHOGRAPHY
    KRASNOPEROVA, AA
    XIAO, J
    CERRINA, F
    DIFABRIZIO, E
    LUCIANI, L
    FIGLIOMENI, M
    GENTILI, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2588 - 2591
  • [45] Reflective x-ray masks for x-ray lithography
    Chumak, V. S.
    Peredkov, S.
    Devizenko, A. Yu
    Kopylets, I. A.
    Pershyn, Yu P.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2024, 34 (04)
  • [46] Use of fractal zone plates for transmission X-ray microscopy
    Xin Ge
    Zhili Wang
    Kun Gao
    Dajiang Wang
    Zhao Wu
    Jian Chen
    Zhiyun Pan
    Kai Zhang
    Youli Hong
    Peiping Zhu
    Ziyu Wu
    Analytical and Bioanalytical Chemistry, 2012, 404 : 1303 - 1309
  • [47] Sliced linear zone plates for hard X-ray radiation
    I. A. Artyukov
    V. A. Burtsev
    A. V. Vinogradov
    A. Yu. Devizenko
    N. V. Kalinin
    I. A. Kopylets
    V. V. Kondratenko
    V. E. Pukha
    B. A. Savitskii
    R. M. Feshchenko
    Technical Physics, 2012, 57 : 1283 - 1288
  • [48] X-ray zooming microscopy with two Fresnel zone plates
    Wakabayashi, Daisuke
    Suzuki, Yoshio
    Shibazaki, Yuki
    Sugiyama, Hiroshi
    Hirano, Keiichi
    Nishimura, Ryutaro
    Hyodo, Kazuyuki
    Igarashi, Noriyuki
    Funamori, Nobumasa
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2022, 93 (03):
  • [49] FABRICATION OF FREESTANDING X-RAY TRANSMISSION GRATINGS AND ZONE PLATES
    VLADIMIRSKY, Y
    KALLNE, E
    SPILLER, E
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 448 : 25 - 37
  • [50] Hard X-ray Fourier transform holography with zone plates
    Watanabe, N
    Yokosuka, H
    Ohigashi, T
    Takano, H
    Takeuchi, A
    Suzuki, Y
    Aoki, S
    SYNCHROTRON RADIATION INSTRUMENTATION, 2004, 705 : 1340 - 1343