Effect of low level O2 addition to N2 on surface cleaning by nonequilibrium atmospheric-pressure pulsed remote plasma

被引：17
|
作者：
Iwasaki, Masahiro
Takeda, Keigo
Ito, Masafumi
Yara, Takuya
Uehara, Tsuyoshi
Hori, Masaru
机构：
[1] Nagoya Univ, Grad Sch Engn, Dept Elect Engn & Comp Sci, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Wakayama Univ, Fac Syst Engn, Dept Optomechatron, Wakayama 6408510, Japan
[3] Sekisui Chem Co Ltd, Tsukuba, Ibaraki 3004292, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2007年 / 46卷 / 20-24期
关键词：
indium tin oxide; plasma cleaning process; oxygen radical; atmospheric-pressure plasma; large area process; pulsed plasma; low gas temperature; nonequilibrium plasma; O-2/N-2;
D O I：
10.1143/JJAP.46.L540
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The effect Of 02 additions below 0.2% to N-2 was investigated for the cleaning of organic contaminants on an indium tin oxide film using a nonequilibrium atmospheric -pressure pulsed plasma. A remarkably high cleaning efficiency was obtained for plasma treatment with additions from 0.025 to 0,1% 02 to N-2. The concentration of the ground state oxygen radical [O((3)p)] was measured using vacuum UV laser absorption spectroscopy. It was found that the key factor for the surface cleaning was the scission of carbon bonds due to UV emissions, and subsequent oxidation due to O(P-3) and ozone.
引用
收藏
页码：L540 / L542
页数：3
相关论文
共 50 条
  • [41] Formation of silicon oxynitride films with low leakage current using N2/O2 plasma near atmospheric pressure
    Hayakawa, R
    Yoshimura, T
    Ashida, A
    Kitahata, H
    Yuasa, M
    Fujimura, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (11B): : 7853 - 7856
  • [42] Inactivation of Escherichia coli Cells in Aqueous Solution by Atmospheric-Pressure N2, He, Air, and O2 Microplasmas
    Zhou, Renwu
    Zhang, Xianhui
    Bi, Zhenhua
    Zong, Zichao
    Niu, Jinhai
    Song, Ying
    Liu, Dongping
    Yang, Size
    APPLIED AND ENVIRONMENTAL MICROBIOLOGY, 2015, 81 (15) : 5257 - 5265
  • [43] Optical diagnostics of breakdown phase of pulsed N2/He atmospheric-pressure microhollow cathode discharge plasma
    Department of Electrical and Electronic Engineering, National Defense Academy, Yokosuaka, Kanagawa 239-8686, Japan
    Jpn. J. Appl. Phys., 1600, 8 PART 2
  • [44] Time-resolved optical emission spectroscopy of nanosecond pulsed discharges in atmospheric-pressure N2 and N2/H2O mixtures
    van der Horst, R. M.
    Verreycken, T.
    van Veldhuizen, E. M.
    Bruggeman, P. J.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (34)
  • [45] Optical Diagnostics of Breakdown Phase of Pulsed N2/He Atmospheric-Pressure Microhollow Cathode Discharge Plasma
    Wake, Shinya
    Nakano, Toshiki
    Kitajima, Takeshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (08)
  • [46] Tuning Effect of N2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films
    Di Lanbo
    Li Xiaosong
    Zhao Tianliang
    Chang Dalei
    Liu Qianqian
    Zhu Aimin
    PLASMA SCIENCE & TECHNOLOGY, 2013, 15 (01) : 64 - 69
  • [47] Tuning Effect of N2 on Atmospheric-Pressure Cold Plasma CVD of TiO2 Photocatalytic Films
    底兰波
    李小松
    赵天亮
    常大磊
    刘倩倩
    朱爱民
    Plasma Science and Technology, 2013, 15 (01) : 64 - 69
  • [48] Prebreakdown phenomena and formation processes of low pressure glow discharges in N2, O2, and N2/O2 mixtures
    Hosokawa, T. (hosokavva@p12.d.dendai.ac.jp), 1600, American Institute of Physics Inc. (94):
  • [49] Prebreakdown phenomena and formation processes of low pressure glow discharges in N2, O2, and N2/O2 mixtures
    Hosokawa, T
    Ohuchi, M
    Ichinose, K
    Kaneda, T
    JOURNAL OF APPLIED PHYSICS, 2003, 94 (08) : 4781 - 4787
  • [50] Stripping of photoresist using a remote thermal Ar/O2 and Ar/N2/O2 plasma
    Brussaard, GJH
    Letourneur, KGY
    Schaepkens, M
    van de Sanden, MCM
    Schram, DC
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (01): : 61 - 66
12345