Low coordination states in Co3O4/NiOx heterostructures by atomic layer deposition for enhanced gas detection

被引:26
|
作者
Lou, Chengming [1 ]
Pan, Hongyin [1 ]
Mei, Houshan [1 ]
Lu, Guocai [1 ]
Liu, Xianghong [1 ]
Zhang, Jun [1 ]
机构
[1] Qingdao Univ, Coll Phys, Qingdao 266071, Peoples R China
基金
中国国家自然科学基金;
关键词
Lower coordination atoms; Oxygen vacancy; NiOx; Gas sensor; Atomic layer deposition; OXYGEN VACANCY; NANOSTRUCTURED MATERIALS; TEMPERATURE; GRAPHENE; DESIGN; TIO2; CO2;
D O I
10.1016/j.cej.2022.137641
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Oxygen vacancy is crucial to modulate the electronic structure and chemical properties of functional materials. However, a general and elegant method that is capable of manipulating the surface defects of materials is still missing. Herein, we propose an efficient strategy based on atomic layer deposition (ALD) to create low coordination atomic states in Co3O4/NiOx heterostructures, which allows for controllable regulation of oxygen vacancies, as well as the electronic and band structure of the materials. Consequently, the sensor device based on optimized Co3O4/NiOx sensing layer exhibits significantly enhanced performance to detect triethylamine (TEA) compared to pristine Co3O4, including lower operating temperature, higher sensitivity and lower limit of detection. Considering the generality of the ALD process, the proposed strategy is expected to be useful to design efficient nanomaterials for surface-oriented applications.
引用
收藏
页数:8
相关论文
共 50 条
  • [1] Growth of thin films of Co3O4 by atomic layer deposition
    Klepper, K. B.
    Nilsen, O.
    Fjellvag, H.
    THIN SOLID FILMS, 2007, 515 (20-21) : 7772 - 7781
  • [2] Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
    Donders, M. E.
    Knoops, H. C. M.
    van de Sanden, M. C. M.
    Kessels, W. M. M.
    Notten, P. H. L.
    ATOMIC LAYER DEPOSITION APPLICATIONS 5, 2009, 25 (04): : 39 - 47
  • [3] Remote Plasma Atomic Layer Deposition of Co3O4 Thin Films
    Donders, M. E.
    Knoops, H. C. M.
    van de Sanden, M. C. M.
    Kessels, W. M. M.
    Notten, P. H. L.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2011, 158 (04) : G92 - G96
  • [4] A cobalt(II) heteroarylalkenolate precursor for homogeneous Co3O4 coatings by atomic layer deposition
    Bueyuekyazi, Mehtap
    Fischer, Thomas
    Yu, Penmgei
    Coll, Mariona
    Mathur, Sanjay
    DALTON TRANSACTIONS, 2017, 46 (38) : 12996 - 13001
  • [5] Characterization of atomic layer deposited semiconducting Co3O4
    Holden, Konner E. K.
    Conley, John F., Jr.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2019, 37 (02):
  • [6] Attachment of Co3O4 layer to SnO2 nanowires for enhanced gas sensing properties
    Kwon, Yong Jung
    Na, Han Gil
    Kang, Sung Yong
    Choi, Myung Sik
    Bang, Jae Hoon
    Kim, Tae Whan
    Mirzaei, Ali
    Kim, Hyoun Woo
    SENSORS AND ACTUATORS B-CHEMICAL, 2017, 239 : 180 - 192
  • [7] Enhanced Gas Sensing Performance of rGO Wrapped Crystal Facet-Controlled Co3O4 Nanocomposite Heterostructures
    Yu, Ting
    Li, Xin
    Chen, Bin
    Yang, Yanxing
    Xu, Keng
    Liu, Yuan
    Gong, Wufei
    Yuan, Cailei
    Yang, Yong
    JOURNAL OF PHYSICAL CHEMISTRY C, 2022, 126 (10): : 4879 - 4888
  • [8] Atomic layer deposition of Co3O4 thin films using a CoI2/O2 precursor combination
    Rooth, Marten
    Lindahl, Erik
    Harsta, Anders
    CHEMICAL VAPOR DEPOSITION, 2006, 12 (04) : 209 - 213
  • [9] LAYER-BY-LAYER DETERMINATION OF VARIOUS OXIDATION-STATES OF COBALT IN CO3O4
    MEHANDJIEV, DR
    DYAKOVA, BD
    VITKOVA, EA
    DOKLADI NA BOLGARSKATA AKADEMIYA NA NAUKITE, 1983, 36 (12): : 1567 - 1570
  • [10] Electrophoretic deposition of Co nanoparticles for Co3O4 films
    Ha, Don-Hyung
    Robinson, Richard
    Gooding, Diana M.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2013, 245